ASTM E1162-2006 报告次级离子质谱法(SIMS)中溅射深度截面数据的标准实施规程
作者:标准资料网
时间:2024-05-22 10:15:59
浏览:8220
来源:标准资料网
下载地址: 点击此处下载
【英文标准名称】:StandardPracticeforReportingSputterDepthProfileDatainSecondaryIonMassSpectrometry(SIMS)
【原文标准名称】:报告次级离子质谱法(SIMS)中溅射深度截面数据的标准实施规程
【标准号】:ASTME1162-2006
【标准状态】:现行
【国别】:
【发布日期】:2006
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:E42.06
【标准类型】:(Practice)
【标准水平】:()
【中文主题词】:数据;深度;深度测量;精整;质谱学;金属;工艺;截面;频谱测定法;表面
【英文主题词】:
【摘要】:ThispracticeisusedforreportingtheexperimentalconditionsasspecifiedinSection6inthex201C;Methodsx201D;orx201C;Experimentalx201D;sectionsofotherpublications(subjecttoeditorialrestrictions).Thereportwouldincludespecificconditionsforeachdataset,particularly,ifanyparametersarechangedfordifferentsputterdepthprofiledatasetsinapublication.Forexample,footnotesoftablesorfigurecaptionswouldbeusedtospecifydifferingconditions.1.1Thispracticecoverstheinformationneededtodescribeandreportinstrumentation,specimenparameters,experimentalconditions,anddatareductionprocedures.SIMSsputterdepthprofilescanbeobtainedusingawidevarietyofprimarybeamexcitationconditions,massanalysis,dataacquisition,andprocessingtechniques(1-4).1.2LimitationsThispracticeislimitedtoconventionalsputterdepthprofilesinwhichinformationisaveragedovertheanalyzedareaintheplaneofthespecimen.Ionmicroprobeormicroscopetechniquespermittinglateralspatialresolutionofsecondaryionswithintheanalyzedarea,forexample,imagedepthprofiling,areexcluded.Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.
【中国标准分类号】:A43
【国际标准分类号】:71_040_50
【页数】:3P.;A4
【正文语种】:
【原文标准名称】:报告次级离子质谱法(SIMS)中溅射深度截面数据的标准实施规程
【标准号】:ASTME1162-2006
【标准状态】:现行
【国别】:
【发布日期】:2006
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:E42.06
【标准类型】:(Practice)
【标准水平】:()
【中文主题词】:数据;深度;深度测量;精整;质谱学;金属;工艺;截面;频谱测定法;表面
【英文主题词】:
【摘要】:ThispracticeisusedforreportingtheexperimentalconditionsasspecifiedinSection6inthex201C;Methodsx201D;orx201C;Experimentalx201D;sectionsofotherpublications(subjecttoeditorialrestrictions).Thereportwouldincludespecificconditionsforeachdataset,particularly,ifanyparametersarechangedfordifferentsputterdepthprofiledatasetsinapublication.Forexample,footnotesoftablesorfigurecaptionswouldbeusedtospecifydifferingconditions.1.1Thispracticecoverstheinformationneededtodescribeandreportinstrumentation,specimenparameters,experimentalconditions,anddatareductionprocedures.SIMSsputterdepthprofilescanbeobtainedusingawidevarietyofprimarybeamexcitationconditions,massanalysis,dataacquisition,andprocessingtechniques(1-4).1.2LimitationsThispracticeislimitedtoconventionalsputterdepthprofilesinwhichinformationisaveragedovertheanalyzedareaintheplaneofthespecimen.Ionmicroprobeormicroscopetechniquespermittinglateralspatialresolutionofsecondaryionswithintheanalyzedarea,forexample,imagedepthprofiling,areexcluded.Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.
【中国标准分类号】:A43
【国际标准分类号】:71_040_50
【页数】:3P.;A4
【正文语种】:
下载地址:
点击此处下载